The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Dec. 27, 2012
Applicant:

Mitsui Mining & Smelting Co., Ltd., Tokyo, JP;

Inventors:

Mitsuyoshi Matsuda, Ageo, JP;

Kazuhiro Yoshikawa, Ageo, JP;

Takao Fujimoto, Ageo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21C 37/00 (2006.01); C25D 7/06 (2006.01); B32B 15/20 (2006.01); C25D 1/04 (2006.01); C25D 3/58 (2006.01);
U.S. Cl.
CPC ...
C25D 7/0614 (2013.01); B32B 15/20 (2013.01); C25D 1/04 (2013.01); C25D 3/58 (2013.01); B32B 2260/021 (2013.01); B32B 2457/08 (2013.01); Y10T 428/31663 (2015.04); Y10T 428/31678 (2015.04);
Abstract

An object of the present invention is to provide an electro-deposited copper-alloy foil excellent in infrared laser processability which enables uniform etching rate along a thickness direction in following etching process. To achieve the object, an electro-deposited copper-alloy foil obtained from electrolyzing of an electrolytic solution, wherein the electro-deposited copper-alloy foil has tin content of 8% by mass to 25% by mass is employed. In the electro-deposited copper-alloy foil, a grain in a crystal structure is preferably a columnar grain longitudinal along a thickness direction.


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