The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Oct. 22, 2012
Applicant:

Tabata Co., Ltd., Tokyo, JP;

Inventor:

Yuji Kuroda, Tokyo, JP;

Assignee:

TABATA CO., LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B63C 11/12 (2006.01);
U.S. Cl.
CPC ...
B63C 11/12 (2013.01);
Abstract

A swimming mask including an elastic skirt of which a rear peripheral region is partially provided with regions having an elastic stretchability higher than that of the remaining regions to ensure the elastic skirt to be kept in close contact with the wearer's facial surface. A rear peripheral portionof an elastic skirtincludes an upper covering region, a lower covering regionand lateral covering regionswherein at least one of the upper covering regionand the lateral covering regionsis formed with a pair of high elastically stretchable regionsadapted to be more easily elastically stretched and contracted in a circumferential direction than a remaining region in the rear peripheral portion


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