The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Feb. 11, 2016
Applicant:

Ep Technologies Llc, Akron, OH (US);

Inventors:

James Ferrell, Stow, OH (US);

Erinn R. Bogovich, Ravenna, OH (US);

Robert L. Gray, Kent, OH (US);

Daphne Pappas Antonakas, Hudson, OH (US);

Tsung-Chan Tsai, Cuyahoga Falls, OH (US);

Sameer Kalghatgi, Copley, OH (US);

Assignee:

EP Technologies LLC, Akron, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L 2/20 (2006.01); H05H 1/24 (2006.01); A61L 2/14 (2006.01);
U.S. Cl.
CPC ...
A61L 2/14 (2013.01); H05H 1/2406 (2013.01); A61L 2202/122 (2013.01); H05H 2001/2412 (2013.01);
Abstract

Exemplary apparatuses and methods of killing or deactivating bacteria are disclosed herein. An exemplary apparatus for killing or deactivating bacteria includes a plasma vapor chamber. The plasma vapor chamber has a vapor inlet for allowing a vapor into the chamber, a high voltage electrode, one or more grounding electrodes. The one or more grounding electrodes at least partially surrounding the plasma vapor chamber. The plasma vapor chamber includes an outlet for allowing fluid to flow out of the chamber. When the chamber is filled with vapor for a period of time sufficient to saturate the chamber with vapor, the high voltage electrode is energized to generate plasma throughout the chamber.


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