The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Apr. 11, 2013
Applicants:

Kim Ta Phuoc, Paris, FR;

Cedric Thaury, Montigny le Bretonneux, FR;

Rahul Shah, Los Alamos, NM (US);

Sebastien Corde, Versailles, FR;

Inventors:

Kim Ta Phuoc, Paris, FR;

Cedric Thaury, Montigny le Bretonneux, FR;

Rahul Shah, Los Alamos, NM (US);

Sebastien Corde, Versailles, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); H01S 3/00 (2006.01); H01S 3/0955 (2006.01);
U.S. Cl.
CPC ...
H01S 3/005 (2013.01); H01S 3/0955 (2013.01); H05G 2/00 (2013.01);
Abstract

A method for producing electromagnetic radiation comprising: firing a first laser pulse and generating a plasma region, the first laser pulse penetrating at least partially into the plasma region to create a plasma density wake in the plasma region; providing a group of charged particles in the plasma region arranged so as to be accelerated in the plasma density wake of the first laser pulse; reflecting the first laser pulse after the first laser pulse has penetrated into the plasma region, to give a reflected laser pulse; and arranging the reflected laser pulse to interact with the group of charged particles to generate an electromagnetic radiation.


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