The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Feb. 09, 2015
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Choong-Ho Lee, Yongin, KR;

Jung-Min Lee, Yongin, KR;

Jun-Sik Oh, Yongin, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); C23C 14/26 (2006.01); C23C 16/455 (2006.01); H01L 51/00 (2006.01); C23C 14/04 (2006.01); C23C 14/12 (2006.01); H01L 51/56 (2006.01); H05B 33/10 (2006.01); C23C 16/46 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/001 (2013.01); C23C 14/042 (2013.01); C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 14/243 (2013.01); C23C 14/246 (2013.01); C23C 14/26 (2013.01); C23C 16/455 (2013.01); C23C 16/46 (2013.01); H01L 51/0008 (2013.01); H01L 51/56 (2013.01); H05B 33/10 (2013.01); H01L 51/5012 (2013.01);
Abstract

A thin film deposition apparatus including a deposition source having a crucible to contain a deposition material and a heater to heat and vaporize the deposition material; a nozzle unit disposed at a side of the deposition source along a first direction and having a plurality of nozzle slits to discharge the deposition material that was vaporized; a plurality of emission coefficient increasing units disposed toward the nozzle unit within the deposition source and increasing a quantity of motion of the deposition material that is discharged toward the nozzle unit; a patterning slit sheet disposed opposite to the nozzle unit and having a plurality of patterning slits arranged along the first direction; and a barrier plate assembly disposed between the nozzle unit and the patterning slit sheet along the first direction, and having a plurality of barrier plates that partition a space between the nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces.


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