The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Apr. 14, 2015
Applicant:

Qunano Ab, Lund, SE;

Inventors:

Werner Seifert, Sebnitz, DE;

Damir Asoli, Malmo, SE;

Zhaoxia Bi, Lund, SE;

Jonas Ohlsson, Malmo, SE;

Lars Ivar Samuelson, Malmo, SE;

Assignee:

QUNANO AB, Lund, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); B82Y 10/00 (2011.01); C30B 25/00 (2006.01); C30B 29/40 (2006.01); C30B 29/60 (2006.01); H01L 21/02 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01); H01L 33/06 (2010.01); H01L 21/20 (2006.01); H01L 33/24 (2010.01); H01L 33/32 (2010.01); H01L 33/18 (2010.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 33/0075 (2013.01); B82Y 10/00 (2013.01); C30B 25/00 (2013.01); C30B 29/406 (2013.01); C30B 29/60 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02458 (2013.01); H01L 21/02603 (2013.01); H01L 21/02636 (2013.01); H01L 21/02639 (2013.01); H01L 21/20 (2013.01); H01L 29/0665 (2013.01); H01L 29/0673 (2013.01); H01L 29/0676 (2013.01); H01L 29/2003 (2013.01); H01L 33/06 (2013.01); H01L 33/24 (2013.01); H01L 33/32 (2013.01); B82Y 40/00 (2013.01); H01L 33/007 (2013.01); H01L 33/18 (2013.01); Y10S 977/932 (2013.01);
Abstract

The present invention relates to the growing of nitride semiconductors, applicable for a multitude of semiconductor devices such as diodes, LEDs and transistors. According to the method of the invention nitride semiconductor nanowires are grown utilizing a CVD based selective area growth technique. A nitrogen source and a metal-organic source are present during the nanowire growth step and at least the nitrogen source flow rate is continuous during the nanowire growth step. The V/III-ratio utilized in the inventive method is significantly lower than the V/III-ratios commonly associated with the growth of nitride based semiconductor.


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