The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2017
Filed:
Oct. 28, 2014
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventor:
Erwan Dornel, Fontaine, FR;
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/763 (2006.01); H01L 27/115 (2006.01); H01L 29/788 (2006.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 27/11517 (2017.01); H01L 29/66 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28273 (2013.01); H01L 21/76232 (2013.01); H01L 27/11517 (2013.01); H01L 29/42324 (2013.01); H01L 29/42336 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01); H01L 29/7881 (2013.01);
Abstract
A method includes forming a shallow trench isolation (STI) region in a substrate, the STI region comprising an etch stop layer; etching the STI region by a first etch to the etch stop layer to form a recess in the STI region; and forming a floating gate, the floating gate comprising a portion that extends into the recess in the STI region, wherein the etch stop layer separates the portion of the floating gate that extends into the recess in the STI region from the substrate.