The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2017
Filed:
Dec. 18, 2015
Applicants:
Ho-jun Seong, Suwon-si, KR;
Jee-hoon Han, Hwaseong-si, KR;
Inventors:
Ho-jun Seong, Suwon-si, KR;
Jee-hoon Han, Hwaseong-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/00 (2006.01); H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 27/11524 (2017.01); H01L 27/11548 (2017.01); H01L 27/1157 (2017.01); H01L 27/11575 (2017.01);
U.S. Cl.
CPC ...
H01L 21/0338 (2013.01); H01L 21/0337 (2013.01); H01L 21/3086 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01L 27/11524 (2013.01); H01L 27/11548 (2013.01); H01L 27/1157 (2013.01); H01L 27/11575 (2013.01);
Abstract
Semiconductor devices and methods of manufacturing the semiconductor devices are provided. The semiconductor devices may include a first line pattern that includes a first main line having a first width and a first subline having a second width, and a second line pattern that includes a second main line having the first width and a second subline having a third width. The first line pattern may include a first width changer whose width increases from the first width to the second width. The second line pattern may include a second width changer whose width increases from the first width to the third width.