The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Feb. 27, 2014
Applicants:

Raymond A. Applegate, Houston, TX (US);

Jason D. Marsack, Houston, TX (US);

Konrad Pesudovs, Gleneig, AU;

Yue Shi, Houston, TX (US);

Inventors:

Raymond A. Applegate, Houston, TX (US);

Jason D. Marsack, Houston, TX (US);

Konrad Pesudovs, Gleneig, AU;

Yue Shi, Houston, TX (US);

Assignee:

University of Houston System, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 3/00 (2006.01); G02C 7/00 (2006.01); G02C 7/02 (2006.01); G02C 7/04 (2006.01);
U.S. Cl.
CPC ...
G02C 7/04 (2013.01); G02C 7/027 (2013.01); G02C 2202/22 (2013.01);
Abstract

Provided herein is a computer program product comprising a non-transitory computer-readable medium storing an algorithm to optimize a wavefront guided correction for a custom ophthalmic lens. The correction is determined from inputs of quantified wavefront error and registration uncertainty and a metric predictive of a visual performance task of interest and provides a level of visual performance within a user-defined performance range. Also provided is a method for optimizing a wavefront guided correction for a custom ophthalmic lens via inputting residual wavefront error values and quantified translational and rotational movements into an algorithm configured to determine the optimal wavefront guided correction therefrom and a custom ophthalmic lens comprising the correction.


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