The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2017
Filed:
May. 12, 2016
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/00 (2006.01); G02B 6/34 (2006.01); G02B 6/42 (2006.01); G02B 6/10 (2006.01); G02B 6/122 (2006.01); B29C 33/38 (2006.01); B29D 11/00 (2006.01); G02B 6/38 (2006.01); G02B 6/12 (2006.01); G02B 6/28 (2006.01);
U.S. Cl.
CPC ...
G02B 6/421 (2013.01); G02B 6/10 (2013.01); G02B 6/1221 (2013.01); G02B 6/4239 (2013.01); G02B 6/4269 (2013.01); G02B 6/4292 (2013.01); B29C 33/3857 (2013.01); B29D 11/00663 (2013.01); G02B 6/12002 (2013.01); G02B 6/2821 (2013.01); G02B 6/3885 (2013.01); G02B 6/423 (2013.01); G02B 6/4204 (2013.01); G02B 2006/12147 (2013.01);
Abstract
A structure includes a combination of a stub fabricated on a polymer and a groove fabricated on a silicon (Si) chip, with which an adiabatic coupling can be realized by aligning a (single-mode) polymer waveguide (PWG) array fabricated on the polymer with a silicon waveguide (SiWG) array fabricated on the silicon chip. The stub fabricated on the polymer is patterned according to a nano-imprint process along with the PWG array in a direction in which the PWG array is fabricated. The groove fabricated on the silicon chip is fabricated along a direction in which the SiWG array is fabricated.