The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Dec. 17, 2015
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Kiyeon Yang, Seongnam-si, KR;

Changseung Lee, Yongin-si, KR;

Namjeong Kim, Gwangju-si, KR;

Yeonhee Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); G01N 27/414 (2006.01); H01L 21/02 (2006.01); H01L 21/3065 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
G01N 27/4141 (2013.01); H01L 21/0262 (2013.01); H01L 21/02568 (2013.01); H01L 21/3065 (2013.01); H01L 29/78681 (2013.01); H01L 29/78696 (2013.01);
Abstract

A transistor includes a substrate, a two-dimensional material including at least one layer that is substantially vertically aligned on the substrate such that an edge of the layer is on the substrate and the layer extends substantially vertical to the substrate, a source electrode and a drain electrode connected to opposite ends of the two-dimensional material, a gate insulation layer on the two-dimensional material between the source electrode and the drain electrode, and a gate electrode on the gate insulation layer. Each layer includes a semiconductor having a two-dimensional crystal structure.


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