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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9657226 B1

PDFFull Text
Date of Patent:
May. 23, 2017

Filed:

Oct. 16, 2014

Composition for etching treatment of resin material

Applicant:

Okuno Chemical Industries Co., Ltd., Osaka-shi, Osaka, JP;

Inventors:

Shingo Nagamine, Osaka, JP;

Koji Kita, Osaka, JP;

Kuniaki Otsuka, Osaka, JP;

Assignee:

OKUNO CHEMICAL INDUSTRIES CO., LTD., Osaka-shi, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian, LLP

Primary Examiner:

Stephanie Duclair

Int. Cl.
CPC ...
C09K 13/00 (2006.01); C09K 13/04 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23C 18/16 (2006.01); C23F 3/02 (2006.01); C23F 1/14 (2006.01); C23C 18/24 (2006.01); C25B 1/28 (2006.01); C08J 7/14 (2006.01); C23C 18/20 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); C23C 18/30 (2006.01); C25D 5/14 (2006.01); C23C 18/28 (2006.01); C23C 18/32 (2006.01); C23C 18/38 (2006.01);
U.S. Cl.
CPC ...
C09K 13/00 (2013.01); C08J 7/14 (2013.01); C09K 13/04 (2013.01); C23C 18/1641 (2013.01); C23C 18/2086 (2013.01); C23C 18/24 (2013.01); C23F 1/14 (2013.01); C23F 3/02 (2013.01); C25B 1/28 (2013.01); C23C 18/1653 (2013.01); C23C 18/285 (2013.01); C23C 18/30 (2013.01); C23C 18/32 (2013.01); C23C 18/38 (2013.01); C25D 5/14 (2013.01); H01L 21/02052 (2013.01); H01L 21/30604 (2013.01);
Abstract

The present invention provides a composition for etching treatment of a resin material, the composition comprising an aqueous solution having a permanganate ion concentration of 0.2 mmol/L or more and a total acid concentration of 10 mol/L or more, and the aqueous solution satisfying at least one of the following conditions (1) to (3): The composition for etching treatment of the present invention is a composition containing no hexavalent chromium and having excellent etching performance and good bath stability.

Find Patent Forward Citations

Nagamine, Shingo. (2017). Composition for etching treatment of resin material (U.S. Patent No. 9657226). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9657226

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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