The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Jul. 07, 2014
Applicants:

The United States of America, As Represented BY the Secretary of the Air Force, Washington, DC (US);

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Isaac M. Ehrenberg, Brookline, MA (US);

Bae-Ian Wu, Beavercreek, OH (US);

Sanjay Emani Sarma, Lexington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 17/06 (2006.01); B05C 21/00 (2006.01);
U.S. Cl.
CPC ...
B05C 21/005 (2013.01);
Abstract

A new 3D stencil mask guides deposition of a shaped structure, typically an electromagnetic device component, onto a non-planar surface. The 3D stencil mask includes islands and bridges from prior art two-dimensional lettering stencils, but raises the islands and stencils above the side of the 3D stencil mask facing a non-planar surface, forming undercuts, so that material particles, such as from vacuum metal deposition, will form connected shapes. The 3D stencil mask is also configures so that the dimensions of the resulting electromagnetic structures are altered from a simple projected image of a structure designed for a planar surface so that the electromagnetic properties of the deposited structure are more nearly the same as those of a corresponding structure on a planar surface.


Find Patent Forward Citations

Loading…