The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Dec. 05, 2012
Applicant:

The Board of Trustees of the Leland Stanford Junior University, Palo Alto, CA (US);

Inventors:

Geoffrey C. Gurtner, Palo Alto, CA (US);

Michael T. Longaker, Stanford, CA (US);

Victor W. Wong, San Francisco, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 45/06 (2006.01); A61K 31/506 (2006.01);
U.S. Cl.
CPC ...
A61K 45/06 (2013.01); A61K 31/506 (2013.01);
Abstract

The formation of scars at a wound site is reduced by contacting the wound site with an effective dose of an inhibitor of focal adhesion kinase (FAK) activity or expression. Blockade of FAK is sufficient to prevent mechanical and inflammatory stimuli from activating MCP-1 pathways. In addition to these chemokine-mediated mechanisms, inhibition of FAK may control fibrosis by blocking fibroblast collagen production. Pharmacologic blockade of FAK significantly reduces scar formation in vivo.


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