The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Sep. 25, 2015
Applicant:

Samsung Electronics Co., Ltd, Suwon-Si, Gyeonggi-do, KR;

Inventors:

Byong-hyun Jang, Suwon-si, KR;

Dongchul Yoo, Seongnam-si, KR;

Jaeyoung Ahn, Seongnam-si, KR;

Hunhyeong Lim, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01L 27/11582 (2017.01);
U.S. Cl.
CPC ...
H01L 29/495 (2013.01); H01L 27/11582 (2013.01);
Abstract

A three dimensional semiconductor memory device includes a vertical channel structure extending in a vertical direction on a substrate; interlayer insulating layers surrounding the vertical channel structure and being stacked in the vertical direction on the substrate, gate electrodes surrounding the vertical channel structure and being disposed between the interlayer insulating layers, corners of the gate electrodes adjacent to the vertical channel structure being rounded, and auxiliary gate insulating patterns disposed between the gate electrodes and the vertical channel structure, wherein a side surface of the auxiliary gate insulating pattern is substantially coplanar with a side surface of the interlayer insulating layer in the vertical direction on the substrate.


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