The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Dec. 17, 2013
Applicant:

Lg Innotek Co., Ltd., Seoul, KR;

Inventors:

Woo Young Chang, Seoul, KR;

Seung Heon Lee, Seoul, KR;

Chi Goo Jun, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/48 (2006.01); G06F 17/50 (2006.01); G02F 1/1343 (2006.01); G06F 3/044 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G02F 1/134309 (2013.01); G06F 3/044 (2013.01); G02F 1/13338 (2013.01); G06F 2203/04112 (2013.01);
Abstract

Disclosed are a method of designing a random pattern, an apparatus for designing a random pattern and an optical substrate including a random pattern according to the same method. The method includes setting a plurality of unit valid pattern regions in a pattern design region; forming a random point coordinate in the unit valid pattern region; and connecting the random point coordinate in the unit valid pattern region to other random point coordinates adjacent to the random point coordinate in a first direction or a second direction.


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