The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Apr. 17, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Hiroki Takahashi, Saitama, JP;
Mototaka Kanaya, Sano, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/115 (2015.01); G02B 1/18 (2015.01); C23C 14/22 (2006.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); C23C 14/226 (2013.01); G02B 1/18 (2015.01);
Abstract
An antireflection multilayer film is formed by alternately laminating high refractive index layers and low refractive index layers having indexes of refraction different from each other. The high refractive index layer is an oblique deposition layer formed by depositing an inorganic material such as tantalum pentoxide onto the surface of an optical element from a diagonal direction, and has minute internal structures composed of slant columnar structures growing along to the deposition direction. The low refractive index layer is an isotropic and dense layer.