The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Nov. 13, 2014
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Jong-Ahn Kim, Daejeon, KR;

Jae-Wan Kim, Daejeon, KR;

Tae-Bong Eom, Daejeon, KR;

Chu-Shik Kang, Daejeon, KR;

Jong-Han Jin, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D 5/347 (2006.01); G01D 5/245 (2006.01);
U.S. Cl.
CPC ...
G01D 5/34707 (2013.01); G01D 5/2455 (2013.01); G01D 5/34746 (2013.01); G01D 5/34776 (2013.01); G01D 5/34792 (2013.01);
Abstract

Provided are an absolute position measurement method, an absolute position measurement apparatus, and a scale. The scale includes a scale pattern formed by replacing repeatedly arranged pseudo-random-codes with a sequence of a linear feedback shift register of N stages using a first symbol with first width representing a first state and a second symbol with second width representing a second state. The first is divided into two or more first symbol areas of different structures, and the second symbol is divided into two or more second symbol areas of different structures. There is at least one overlap area in which the first symbol and the second symbol overlap each other to have the same structure.


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