The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Feb. 26, 2013
Applicant:

L'oreal, Paris, FR;

Inventors:

Ludovic Thevenet, Bourg la Reine, FR;

Xavier Blin, Paris, FR;

Assignee:

L'OREAL, Paris, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 8/02 (2006.01); A45D 33/00 (2006.01); A45D 34/00 (2006.01); A61Q 1/02 (2006.01); A61Q 3/02 (2006.01); A61K 8/19 (2006.01); A45D 34/04 (2006.01); A45D 29/00 (2006.01); A61Q 1/06 (2006.01);
U.S. Cl.
CPC ...
A61K 8/0241 (2013.01); A45D 33/00 (2013.01); A45D 34/00 (2013.01); A45D 34/04 (2013.01); A45D 34/045 (2013.01); A61K 8/19 (2013.01); A61Q 1/02 (2013.01); A61Q 3/02 (2013.01); A45D 29/004 (2013.01); A45D 2034/007 (2013.01); A45D 2200/25 (2013.01); A61K 2800/47 (2013.01); A61K 2800/88 (2013.01); A61Q 1/06 (2013.01);
Abstract

A method of applying makeup to a surface, such as the skin, the nails, hair, or the lips, is disclosed. The method includes manually depositing, using a non-magnetic cosmetic applicator, at least a first cosmetic composition in the fluid state on the surface, the first composition containing magnetic particles that are movable under the effect of a magnetic field; and manually exposing at least part of the first composition to a magnetic device producing a magnetic field, the magnetic device located above the first composition so as to orientate and/or displace at least a fraction of the magnetic particles so as to form at least one pattern according to magnetic field lines of the magnetic field without making contact with the first composition.


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