The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Sep. 02, 2013
Applicant:
Wavelight Gmbh, Erlangen, DE;
Inventors:
Tobias Jeglorz, Stein, DE;
Christof Donitzky, Eckental, DE;
Assignee:
Wavelight GmbH, , DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/14 (2006.01); A61B 3/10 (2006.01); G01B 11/24 (2006.01); G01B 11/245 (2006.01); G02B 26/10 (2006.01); A61B 3/11 (2006.01); G01B 9/02 (2006.01); G02B 26/12 (2006.01);
U.S. Cl.
CPC ...
A61B 3/1025 (2013.01); A61B 3/102 (2013.01); A61B 3/1005 (2013.01); A61B 3/111 (2013.01); A61B 3/14 (2013.01); G01B 9/02091 (2013.01); G01B 11/245 (2013.01); G01B 11/2441 (2013.01); G02B 26/101 (2013.01); G02B 26/105 (2013.01); G02B 26/123 (2013.01);
Abstract
In an embodiment, a scanning optical system comprises first and second optical sources and a deflector device. The first and second optical sources provide first and second beams, respectively, of optical radiation. The deflector device is disposed to receive and deflect the first and second beams, and is configured for a scanning operation on a beam of radiation traversing the deflector device. The first beam is incident on the deflector device with a first orientation and the second beam is incident on the deflector device with a second orientation that is different from the first orientation.