The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Feb. 01, 2016
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Jagar Singh, Clifton Park, NY (US);

Shesh Mani Pandey, Saratoga Springs, NY (US);

Josef Watts, Saratoga Springs, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/861 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 27/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/8613 (2013.01); H01L 27/0814 (2013.01); H01L 29/063 (2013.01); H01L 29/66136 (2013.01);
Abstract

Diodes for use in FinFET technologies having increased junction electric fields without the need for increased dopant concentrations, as well as methods, apparatus, and systems for fabricating such diodes. The diodes may comprise a semiconductor substrate and a plurality of fins formed on the semiconductor substrate; wherein each of the plurality of fins comprises an N channel doped region comprising an N channel dopant, and the semiconductor substrate further comprises a plurality of P channel doped regions comprising a P channel dopant, wherein each of the P channel doped regions is disposed under one of the plurality of fins and is adjacent to the N channel doped region of the fin.


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