The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Feb. 17, 2016
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Hiroaki Sano, Chofu, JP;
Yuto Nozaki, Kawasaki, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14685 (2013.01); H01L 27/14627 (2013.01); H01L 27/14687 (2013.01);
Abstract
An inorganic film is dry-etched using plasma with a photoresist pattern serving as a mask, and an organic film is dry-etched using plasma with the photoresist pattern serving as a mask without exposing a pad electrode. The photoresist pattern is removed using a stripping solution. After the removal of the photoresist pattern using a stripping solution, the organic film is etched to expose the pad electrode with the inorganic film that remains after the dry etching of the inorganic film using plasma serving as a mask.