The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Jan. 26, 2015
Applicants:

Jung-gil Yang, Suwon-si, KR;

Tae-yong Kwon, Suwon-si, KR;

Xingui Zhang, Suwon-si, KR;

Sang-su Kim, Yongin-si, KR;

Inventors:

Jung-gil Yang, Suwon-si, KR;

Tae-yong Kwon, Suwon-si, KR;

Xingui Zhang, Suwon-si, KR;

Sang-su Kim, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); H01L 29/207 (2006.01); H01L 27/092 (2006.01); H01L 29/78 (2006.01); H01L 29/49 (2006.01); H01L 29/201 (2006.01); H01L 29/20 (2006.01); H01L 21/8252 (2006.01); H01L 21/8258 (2006.01); H01L 27/06 (2006.01); H01L 21/28 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823828 (2013.01); H01L 21/28264 (2013.01); H01L 21/8252 (2013.01); H01L 21/8258 (2013.01); H01L 21/823842 (2013.01); H01L 27/0605 (2013.01); H01L 27/092 (2013.01); H01L 27/0922 (2013.01); H01L 27/0924 (2013.01); H01L 27/0928 (2013.01); H01L 29/201 (2013.01); H01L 29/2003 (2013.01); H01L 29/207 (2013.01); H01L 29/4966 (2013.01); H01L 29/66522 (2013.01); H01L 29/78 (2013.01); H01L 29/785 (2013.01);
Abstract

Example embodiments relate to a metal-oxide semiconductor field effect transistor (MOSFET) of a high performance operating with a necessary threshold voltage while including a channel region formed based on a group III-V compound, and a method of manufacturing the MOSFET. The MOSFET includes a substrate, a semiconductor layer including a group III-V compound on the substrate, and a gate structure disposed on the semiconductor layer, and including a gate electrode formed based on metal and undergone an ion implantation process.


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