The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Apr. 09, 2015
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

George Theodore Dalakos, Schenectady, NY (US);

Mark Alan Frontera, Ballston Lake, NY (US);

Vance Scott Robinson, Schenectady, NY (US);

William Robert Ross, Rotterdam, NY (US);

Xi Zhang, Ballston Lake, NY (US);

Assignee:

General Electric Company, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 35/12 (2006.01); H01J 35/10 (2006.01);
U.S. Cl.
CPC ...
H01J 35/12 (2013.01); H01J 2235/088 (2013.01); H01J 2235/1204 (2013.01); H01J 2235/1233 (2013.01); H01J 2235/1291 (2013.01);
Abstract

In various embodiments, a multi-layer X-ray source target is provided having two or more layers of target material at different depths and different thicknesses. In one such embodiment the X-ray generating layers increase in thickness in relationship to their depth relative to the electron beam facing surface of the source target, such that X-ray generating layer further from this surface are thick than X-ray generating layers closer to the electron beam facing surface.


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