The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Nov. 25, 2013
Applicant:
Globalfoundries, Inc., Grand Cayman, KY;
Inventor:
Francois Weisbuch, Dresden, DE;
Assignee:
GLOBALFOUNDRIES, INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/46 (2006.01); G06T 5/50 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06K 9/4604 (2013.01); G06T 5/50 (2013.01); G06T 7/001 (2013.01); G06T 7/0085 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20216 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method of determining an average contour of a patterned feature on a wafer includes providing a reference contour corresponding to the patterned feature on the wafer, providing a plurality of images of the patterned feature, extracting from the plurality of images a plurality of extracted contours that represent the patterned feature, eliminating flyers from the plurality of extracted contours, and generating the average contour of the patterned feature based on the extracted contours remaining after elimination of the flyers.