The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Jan. 08, 2014
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Chung-Lien Ho, Hsinchu, TW;

Ren-Jr Chen, Hsinchu, TW;

Assignee:

Industrial Technology Research Institute, Chutung Township, Hsinchu County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 29/34 (2006.01); G01N 29/26 (2006.01); G01N 29/06 (2006.01);
U.S. Cl.
CPC ...
G01N 29/262 (2013.01); G01N 29/0654 (2013.01); G01N 2291/02491 (2013.01);
Abstract

A nonlinear dynamic focusing control method includes: (1) using a minimum length in a scan line having the minimum length and a maximum length as an initial location and assigning a focal point on the scan line; (2) calculating half depth of focus of the focal point, and the initial location plus the half depth of focus of the focal point being the location of this focal point on the scan line; (3) determining an initial calculation location of the next focal point by adding the half depth of focus of the focal point from the location of this focal point on the scan line in the direction of the maximum length; and (4) determining if the initial calculation location of the next focal point is greater than the maximum length.


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