The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Mar. 28, 2011
Applicants:

Masaru Yuasa, Kyoto, JP;

Atsushi Toyama, Kumamoto, JP;

Inventors:

Masaru Yuasa, Kyoto, JP;

Atsushi Toyama, Kumamoto, JP;

Assignee:

WACOAL Corp., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D04B 21/20 (2006.01); A41D 13/00 (2006.01); D04B 1/24 (2006.01);
U.S. Cl.
CPC ...
D04B 21/207 (2013.01); A41D 13/0015 (2013.01); D04B 1/246 (2013.01); A41B 2400/38 (2013.01); A41B 2500/10 (2013.01); D10B 2501/02 (2013.01); Y10T 428/24942 (2015.01);
Abstract

A knitted fabric includes: a first knitted fabric region and a second knitted fabric region. The first region and the second region have different elongations from each other. The knitted fabric further includes buffer regions. The buffer regions are provided in at least one of the first region and the second region so as to be in contact with the first region and the second region. The buffer regions each have an elongation set so that, as the buffer region extends toward either one of the first region and the second region, the difference between the elongation of the buffer region and the elongation of the first region or the second region toward which the buffer region extends is reduced gradually. Between the first region and the second region, there is no boundary line that is substantially parallel to the course direction of the knitted fabric.


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