The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Mar. 28, 2014
Applicant:

Shima Seiki Mfg., Ltd., Wakayama-shi, Wakayama, JP;

Inventors:

Takashi Kino, Wakayama, JP;

Masamitsu Ikenaka, Wakayama, JP;

Assignee:

SHIMA SEIKI MFG., LTD., Wakayama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D04B 1/22 (2006.01); D04B 1/24 (2006.01); D04B 7/10 (2006.01);
U.S. Cl.
CPC ...
D04B 1/22 (2013.01); D04B 1/24 (2013.01); D04B 7/10 (2013.01);
Abstract

There is provided a method for knitting a knitted fabric, different from a conventional method, of forming a suppressing section for suppressing a stretch in the knitting width direction of the knitted fabric in the knitting process of the knitted fabric. One side in a longitudinal direction of needle beds (FB, BB) is assumed as a moving direction (DR). A suppressing section () is formed by repeating performing of a bind-off process, in which a first stitch () held on one needle bed (FB) is overlapped with a second stitch () that is proximate in the moving direction (DR) and a retaining stitch () is knitted following in a wale direction of a double stitch () of the first stitch () and the second stitch (), and forming of a new base stitch () branched from at least one of the first stitch () and the second stitch ().


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