The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Jun. 28, 2012
Applicants:
Satoshi Tamai, Tokyo, JP;
Kunio Yube, Tokyo, JP;
Satoshi Okabe, Tokyo, JP;
Inventors:
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C23F 1/18 (2006.01); C23F 1/26 (2006.01); H01L 21/3213 (2006.01); C23F 1/44 (2006.01); C09K 13/04 (2006.01); H05K 3/06 (2006.01); C23F 1/16 (2006.01);
U.S. Cl.
CPC ...
C23F 1/18 (2013.01); C09K 13/04 (2013.01); C23F 1/16 (2013.01); C23F 1/26 (2013.01); C23F 1/44 (2013.01); H01L 21/32134 (2013.01); H05K 3/067 (2013.01); H05K 2201/0338 (2013.01);
Abstract
The present invention relates to an etching solution for copper or a compound comprised mainly of copper, wherein the etching solution contains (A) a maleic acid ion source and (B) a copper ion source, and an etching method using the etching solution.