The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Aug. 18, 2015
Applicant:

National Tsing Hua University, Hsinchu, TW;

Inventors:

Fan-Gang Tseng, New Taipei, TW;

Pen-Cheng Wang, Hsinchu, TW;

Tung-Yua Lee, Hsinchu, TW;

Chun-Ting Lin, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); C23C 14/14 (2006.01); C23C 14/58 (2006.01); C23C 14/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/14 (2013.01); C23C 14/024 (2013.01); C23C 14/5873 (2013.01);
Abstract

A method of fabricating a composite PDMS microstructure includes a defining step, a depositing step and an etching step. The defining step is performed for defining a patterned area having a mono-molecule with a thiol group on a PDMS substrate, and the mono-molecule with the thiol group is in liquid phase. The depositing step is performed for placing the PDMS substrate having the mono-molecule with the thiol group into a vacuum chamber within an activation time so as to deposit one Au atom on the patterned area of the PDMS substrate by a vacuum coating process. The etching step is performed for cleaning the PDMS substrate using water, and thus the Au atom can be selectively retained on the patterned area of the PDMS substrate.


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