The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9643361 B1

PDF
Full Text
Expired
Date of Patent:
May. 09, 2017

Filed:

Jul. 03, 2014
Applicant:

Jian Liu, Sunnyvale, CA (US);

Inventor:

Jian Liu, Sunnyvale, CA (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C 67/00 (2017.01); B22F 3/105 (2006.01); B28B 1/00 (2006.01); B33Y 30/00 (2015.01); B33Y 10/00 (2015.01); B33Y 50/02 (2015.01); B23K 26/0622 (2014.01); B23K 26/342 (2014.01);
U.S. Cl.
CPC ...
B29C 67/0085 (2013.01); B22F 3/1055 (2013.01); B23K 26/0624 (2015.10); B23K 26/342 (2015.10); B28B 1/001 (2013.01); B29C 67/0077 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B22F 2003/1057 (2013.01); Y02P 10/295 (2015.11);
Abstract

Methods and systems for three-dimensional additive manufacturing of samples are disclosed, including generating electromagnetic radiation from an ultrashort pulse laser, wherein the electromagnetic radiation comprises a wavelength, a pulse repetition rate, a pulse width, a pulse energy, and an average power; focusing the electromagnetic radiation into a focal region; using a powder delivery system comprising a powder vessel, a roller, and a receptacle to deposit one or more powders from the powder vessel into a receptacle at the focal region of the electromagnetic radiation and to spread the one or more powders in the receptacle into a fabrication powder bed; and using a computer to adjust the micro and macro pulses, macro pulse repetition rate, and the average power of the ultrashort pulse laser. The samples may be made with micron and/or submicron level precision and/or feature size and may be made using high temperature materials. Other embodiments are described and claimed.


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