The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Dec. 28, 2015
Trumpf Lasersystems for Semiconductor Manufacturing Gmbh, Ditzingen, DE;
Joachim Schulz, Gerlingen, DE;
Martin Lambert, Korb, DE;
TRUMPF Lasersystems for Semiconductor Manufacturing GmbH, Ditzingen, DE;
Abstract
An extreme ultraviolet radiation generating device includes a source operable to generate a first and second entrance beam, and a beam unit operable to modify at least one of a direction and a beam divergence of the first and second entrance beam, in which the beam unit includes: a beam splitter to receive the first and second entrance beam, the beam splitter being configured to reflect the first entrance beam as a first exit beam and to transmit the second entrance beam; and a mirror in the beam path of the transmitted, second entrance beam to reflect the second entrance beam to form a second exit beam that is transmitted by the beam splitter and that is at least partially superposed on the first exit beam, in which the beam unit is configured to modify an angle and/or beam divergence between the first and second exit beam.