The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9640412 B1

PDF
Full Text
Expired
Date of Patent:
May. 02, 2017

Filed:

Nov. 20, 2009
Applicants:

Wolfgang Aderhold, Cupertino, CA (US);

Joseph M. Ranish, San Jose, CA (US);

Blake R. Koelmel, Mountain View, CA (US);

Inventors:

Wolfgang Aderhold, Cupertino, CA (US);

Joseph M. Ranish, San Jose, CA (US);

Blake R. Koelmel, Mountain View, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A21B 2/00 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/324 (2013.01); H01L 21/67109 (2013.01); H01L 21/67115 (2013.01);
Abstract

The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a dynamic heat sink that is substantially transparent to light from a radiant heat source, the dynamic heat sink being positioned near the substrate so the two are coupled. Additional embodiments of the invention are directed to methods of processing a substrate using the apparatuses described.


Find Patent Forward Citations

Loading…