The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Jan. 05, 2010
Qin Lin, Rolla, MO (US);
Rama Puligadda, Rolla, MO (US);
James Claypool, Rolla, MO (US);
Douglas J. Guerrero, Rolla, MO (US);
Brian Smith, Rolla, MO (US);
Qin Lin, Rolla, MO (US);
Rama Puligadda, Rolla, MO (US);
James Claypool, Rolla, MO (US);
Douglas J. Guerrero, Rolla, MO (US);
Brian Smith, Rolla, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.