The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Mar. 04, 2014
Applicant:
Spts Technologies Limited, Ringland Way, Newport, GB;
Inventor:
Oliver James Ansell, Berkeley, GB;
Assignee:
SPTS Technologies Limited, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/66 (2006.01); B81C 99/00 (2010.01);
U.S. Cl.
CPC ...
H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01L 22/26 (2013.01); B81C 99/0065 (2013.01); B81C 2201/0135 (2013.01); B81C 2201/0142 (2013.01);
Abstract
A method is for etching the whole width of a substrate to expose buried features. The method includes etching a face of a substrate across its width to achieve substantially uniform removal of material; illuminating the etched face during the etch process; applying edge detection techniques to light reflected or scattered from the face to detect the appearances of buried features; and modifying the etch in response to the detection of the buried feature. An etching apparatus for etching substrate across its width to expose buried is also disclosed.