The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Feb. 24, 2010
Haydn N. G. Wadley, Keswick, VA (US);
Goesta Mattausch, Ullersdorf, DE;
Henry Morgner, Dresden, DE;
Frank-holm Roegner, Dresden, DE;
Haydn N. G. Wadley, Keswick, VA (US);
Goesta Mattausch, Ullersdorf, DE;
Henry Morgner, Dresden, DE;
Frank-Holm Roegner, Dresden, DE;
University of Virginia Patent Foundation, Charlottesville, VA (US);
Abstract
A plasma generation process that is more optimized for vapor deposition processes in general, and particularly for directed vapor deposition processing. The features of such an approach enables a robust and reliable coaxial plasma capability in which the plasma jet is coaxial with the vapor plume, rather than the orthogonal configuration creating the previous disadvantages. In this way, the previous deformation of the vapor gas jet by the work gas stream of the hollow cathode pipe can be avoided and the carrier gas consumption needed for shaping the vapor plume can be significantly decreased.