The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Apr. 03, 2013
Shigeki Tanemura, Milpitas, CA (US);
Yoshitaka Sasaki, Santa Clara, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Yukinori Ikegawa, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Seiichiro Tomita, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Yoshitaka Sasaki, Santa Clara, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Yukinori Ikegawa, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Seiichiro Tomita, Milpitas, CA (US);
HEADWAY TECHNOLOGIES, INC., Milpitas, CA (US);
Abstract
A method of manufacturing a plasmon generator includes the steps of: forming an initial film made of a metal polycrystal and including a pre-plasmon-generator portion that later becomes the plasmon generator; heating the initial film with heating light so that a plurality of crystal grains constituting the metal polycrystal grow at least in the pre-plasmon-generator portion; stopping the heating of the initial film; and forming the plasmon generator by processing the initial film after the step of stopping the heating. The step of forming the plasmon generator includes the step of providing the pre-plasmon-generator portion with a front end face that generates near-field light.