The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Aug. 27, 2015
Lytro, Inc., Mountain View, CA (US);
Kent Oberheu, Berkeley, CA (US);
Colvin Pitts, Snohomish, WA (US);
Duane Petrovich, San Francisco, CA (US);
Ariel Braunstein, San Francisco, CA (US);
Lytro, Inc., Mountain View, CA (US);
Abstract
An image such as a light-field image may be captured with a light-field image capture device with a microlens array. The image may be received in a data store along with a depth map that indicates depths at which objects in different portions of the image are disposed. A function may be applied to the depth map to generate a mask that defines a gradual transition between the different depths. An effect may be applied to the image through the use of the mask such that applicability of the effect is determined by the mask. A processed image may be generated. The first effect may be present in the processed image, as applied previously. The processed image may be displayed on a display device. If desired, multiple effects may be applied through the generation of multiple masks, depth maps, and/or intermediate images prior to generation of the processed image.