The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Oct. 07, 2013
Applicant:

Empa Eidgenössische Materialprüfungs- Und Forschungsanstalt, Dübendorf, CH;

Inventors:

Markus Mangold, Dübendorf, CH;

Bela Tuzson, Dübendorf, CH;

Lukas Emmenegger, Dübendorf, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/03 (2006.01); G01N 21/3504 (2014.01);
U.S. Cl.
CPC ...
G01N 21/031 (2013.01); G01N 21/3504 (2013.01); G01N 2201/064 (2013.01);
Abstract

A Multi-pass optical cell () with an internal space () for laser spectroscopy is described, which is able to reduce or eliminate interference fringes appearing by performing laser absorption spectroscopy in the multi-pass optical cells () leading to improved absorption spectra. This is achieved by using a multi-pass optical cell () comprising an absorption mask () which is permanently or removable mountable in the internal space () in a rotatably fixed manner, where in a mask wall () a plurality of m apertures () is formed, in which the position of each aperture () is adapted to a predefinable propagation path of a main optical beam and/or the resulting reflection spot pattern () defined by the geometry of the multi-pass optical cell () and the used angle of incidence of an initial beam (), so that each aperture () is traversable by the main optical beam from a first side () to a second side ().


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