The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Jan. 06, 2014
Applicant:

Samsung Electronics Co., Ltd., Gyeonggi-do, KR;

Inventors:

Jong-Cheol Jeong, Namyangju-si, KR;

Kyung-Hwan Jeong, Hwaseong-si, KR;

Jong-Soo Kim, Suwon-si, KR;

Pil-Kwon Jun, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 1/22 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 1/22 (2013.01); G01N 33/0009 (2013.01); G01N 33/0011 (2013.01); Y10T 137/87619 (2015.04); Y10T 436/25875 (2015.01);
Abstract

An apparatus for providing a sample gas includes a gas dosing part, a first pressure gauge for measuring a pressure of a sample gas dosed through the gas dosing part, a plurality of flow lines positioned between the gas dosing part and a gas analyzer that can be opened or closed according to the pressure measured by the first pressure gauge, a plurality of control valves respectively formed in the plurality of flow lines and controlling the plurality of flow lines to be opened or closed, a bypass line formed on at least one of the plurality of flow lines and exhausting some of the sample gas flowing along the flow lines, and a controller for selecting one of the plurality of flow lines according to the pressure measured by the first pressure gauge and controlling the control valves formed in the selected flow line.


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