The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Apr. 30, 2014
Dow Global Technologies Llc, Midland, MI (US);
Karl Züercher, Samstagern, CH;
Cornelis F. J. den Doelder, Terneuzen, NL;
Marc A. Mangnus, Clinge, NL;
Dow Global Technologies LLC, Midland, MI (US);
Abstract
The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process comprising at least one autoclave reactor, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process comprising at least one autoclave reactor, such composition comprising the following properties: A) a melt index (I2) from 2.5 to 10 g/10 min; B) a density from 0.920 to 0.935 g/cc; and wherein the second polymer is present in an amount from 5 to 95 weight percent, based on the sum of the weight of the first polymer and the second polymer; and wherein the density of the of the second polymer is greater than the density of the first polymer, and wherein the first polymer has a melt index I2 greater than 2.5 g/10 min.