The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Apr. 24, 2015
Boe Technology Group Co., Ltd., Beijing, CN;
Kelvin Chiang, Beijing, CN;
Peng Zhang, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
A mask cleaning apparatus and a mask cleaning method are provided. The mask cleaning method comprises: placing a mask () on a stage (); and ejecting a dry ice particle group including a plurality of dry ice particles () toward a surface of the mask () at a speed of 340 m/s to 1000 m/s, within a cleaning time, wherein the plurality of dry ice particles () impact the surface of the mask () so as to remove a contaminant on the surface of the mask. Thereby, the mask cleaning apparatus and the mask cleaning method provided by embodiments of the present disclosure can remove the contaminant on the mask, without increasing a contamination medium and damaging the surface of the mask.