The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Aug. 21, 2014
Applicant:
General Electric Company, Schenectady, NY (US);
Inventor:
Qingshan Jason Niu, Excelsior, MN (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 69/42 (2006.01); B01D 71/60 (2006.01); B01D 67/00 (2006.01); B01D 69/12 (2006.01); B01D 71/56 (2006.01); B01D 61/08 (2006.01); C08G 69/26 (2006.01); C08G 69/32 (2006.01); B01D 61/02 (2006.01);
U.S. Cl.
CPC ...
B01D 71/60 (2013.01); B01D 61/08 (2013.01); B01D 67/0006 (2013.01); B01D 69/125 (2013.01); B01D 71/56 (2013.01); C08G 69/26 (2013.01); C08G 69/32 (2013.01); C08G 69/42 (2013.01); B01D 61/025 (2013.01); B01D 61/027 (2013.01); B01D 2323/30 (2013.01); C08G 2340/00 (2013.01);
Abstract
The present disclosure relates to polymeric matrices composed of protected amine compound residues and membranes composed from such polymeric matrices. In particular, the present disclosure relates to a polymeric matrix comprising amine compound residues, acyl compound residues and protected amine compound residues.
Quick Actions:
Niu, Qingshan. (2017). Polymeric matrices formed from monomers comprising a protected amine group (U.S. Patent No. 9636643). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9636643
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile