The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Oct. 28, 2013
Applicant:
Advanced Micro-fabrication Equipment Inc, Shanghai, Shanghai, CN;
Inventors:
Xiaoming He, Shanghai, CN;
Tuqiang Ni, Shanghai, CN;
Assignee:
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI, Shanghai, CN;
Primary Examiner:
Int. Cl.
CPC ...
H01T 23/00 (2006.01); H01L 21/683 (2006.01); C23C 16/30 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); C23C 16/30 (2013.01); C23C 16/40 (2013.01); Y10T 29/49002 (2015.01);
Abstract
An advanced coating for electrostatic chuck used in plasma processing chamber is provided. The advanced coating is formed using plasma enhanced physical vapor deposition. The coating is generally of YO/AlO, although other material combinations can be used. Also, a multi-layered coating can be formed, such that an intermediate coating layer can be formed using standard plasma spray, and a top coating can be formed using PEPVD. The entire ESC assembly can be 'packaged' by the coating.