The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Nov. 20, 2014
Applicant:
Raytheon Corporation, Waltham, MA (US);
Inventors:
David Van Lue, El Segundo, CA (US);
Andrew L. Bullard, El Segundo, CA (US);
Hans P. Naepflin, El Segundo, CA (US);
Assignee:
Raytheon Company, Waltham, MA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16H 27/02 (2006.01); G02B 7/182 (2006.01); F16H 25/20 (2006.01); G01D 5/14 (2006.01); B23Q 1/26 (2006.01); G02B 7/183 (2006.01);
U.S. Cl.
CPC ...
G02B 7/182 (2013.01); B23Q 1/26 (2013.01); F16H 25/20 (2013.01); G01D 5/14 (2013.01); G02B 7/183 (2013.01); G02B 7/1827 (2013.01); F16H 2025/2043 (2013.01);
Abstract
Systems that provide an active adjustment of mirrors and specifically of secondary mirrors, and that provide active adjustment of secondary mirrors in six degrees of freedom, and that can carry the additional load during launch.