The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2017

Filed:

Dec. 02, 2013
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Seong Hwan Lee, Daejeon, KR;

Dong Ryul Kim, Daejeon, KR;

Jang Yeon Hwang, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/458 (2013.01); C23C 16/45548 (2013.01); C23C 16/45578 (2013.01); C23C 16/545 (2013.01);
Abstract

Provided are a device for forming a layer and an atomic layer deposition (ALD) method or a method for forming a layer. The present application provides a device for forming a layer which may effectively form a desired layer by a continuous ALD, and an ALD method or a method for forming a layer by using the device for forming a layer.


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Lee, Seong. (2017). Device for forming a layer (U.S. Patent No. 9631275). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9631275

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