The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2017

Filed:

Oct. 14, 2011
Applicants:

Quoc Tran Pham, Anaheim, CA (US);

Michael Deming, Trabuco Canyon, CA (US);

Theodore A. Waniuk, Lake Forest, CA (US);

Sean O'keeffe, Tustin, CA (US);

Inventors:

Quoc Tran Pham, Anaheim, CA (US);

Michael Deming, Trabuco Canyon, CA (US);

Theodore A. Waniuk, Lake Forest, CA (US);

Sean O'Keeffe, Tustin, CA (US);

Assignee:

Crucible Intellectual Property, LLC, Rancho Santa Margarita, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22D 25/06 (2006.01); B22D 17/04 (2006.01); B22D 17/20 (2006.01); C22C 45/10 (2006.01); C22C 45/00 (2006.01); C22C 45/02 (2006.01); B22D 17/14 (2006.01); B22D 17/22 (2006.01); B22D 27/15 (2006.01);
U.S. Cl.
CPC ...
B22D 25/06 (2013.01); B22D 17/04 (2013.01); B22D 17/14 (2013.01); B22D 17/20 (2013.01); B22D 17/203 (2013.01); B22D 17/2038 (2013.01); B22D 17/22 (2013.01); B22D 27/15 (2013.01); C22C 45/00 (2013.01); C22C 45/001 (2013.01); C22C 45/003 (2013.01); C22C 45/02 (2013.01); C22C 45/10 (2013.01);
Abstract

Disclosed is an apparatus comprising at least one gate and a vessel, the gate being configured to move between a first position to restrict entry into an ejection path of the vessel and contain a material in a meltable form within the vessel during melting of the material, and a second position to allow movement of the material in a molten form through the ejection path. The gate can move linearly or rotate between its first and second positions, for example. The apparatus is configured to melt the material and the at least one gate is configured to allow the apparatus to be maintained under vacuum during the melting of the material. Melting can be performed using an induction source. The apparatus may also include a mold configured to receive molten material and for molding a molded part, such as a bulk amorphous alloy part.


Find Patent Forward Citations

Loading…