The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Mar. 24, 2011
Donald C. D. Chang, Thousand Oaks, CA (US);
Frank LU, Reseda, CA (US);
Yulan Sun, Ganoga Park, CA (US);
Donald C. D. Chang, Thousand Oaks, CA (US);
Frank Lu, Reseda, CA (US);
Yulan Sun, Ganoga Park, CA (US);
Spatial Digital Systems, Inc., Agoura Hills, CA (US);
Abstract
An advanced digital beam forming technique is achieved that is capable of simultaneously forming multiple beams and attenuating the cross-pol component at multiple locations. The proposed invention, comprising a series of signal inputs, optimization loops and weighting processes, successfully eliminates the side effect of an increase of the cross-pol in the process of beam-forming, thus reducing potential interference. This technique utilizes the orthogonally polarized signal component which is already available and can minimize both the horizontally polarized and vertically polarized cross-pol at the same time. The complexity of computation can be reduced by using only part of the orthogonal polarized components in the optimization.