The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2017

Filed:

Feb. 25, 2015
Applicant:

Electronics and Telecommunications Research Institute, Daejeon, KR;

Inventors:

Han Young Yu, Daejeon, KR;

Yark Yeon Kim, Daejeon, KR;

Won Ick Jang, Daejeon, KR;

Yong Sun Yoon, Daejeon, KR;

Bong Kuk Lee, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H01J 7/42 (2006.01); H05H 1/36 (2006.01); H05H 1/48 (2006.01); H05H 1/34 (2006.01);
U.S. Cl.
CPC ...
H01J 7/42 (2013.01); H01J 7/24 (2013.01); H05H 1/34 (2013.01); H05H 1/36 (2013.01); H05H 1/48 (2013.01);
Abstract

Provided herein an apparatus for generating plasma, the apparatus including a nozzle array, first electrode, and housing. The nozzle discharges plasma. The first electrode is disposed to surround the nozzle array. The housing is disposed to surround the nozzle array and first electrode. The nozzle includes a plurality of nozzles disposed adjacent to one another and in the form of an array, each nozzle configured to discharge plasma. Therefore, it is possible to generate a large size plasma evenly and stably.


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