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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9626996 B1

PDFFull Text
Date of Patent:
Apr. 18, 2017

Filed:

Jan. 02, 2015

Block copolymer self-assembly for pattern density multiplication and rectification

Applicant:

Seagate Technology Llc, Cupertino, CA (US);

Inventors:

XiaoMin Yang, Livermore, CA (US);

Zhaoning Yu, Palo Alto, CA (US);

Kim Yang Lee, Fremont, CA (US);

Michael Feldbaum, San Jose, CA (US);

Yautzong Hsu, Fremont, CA (US);

Wei Hu, Newark, CA (US);

Shuaigang Xiao, Fremont, CA (US);

Henry Yang, San Jose, CA (US);

HongYing Wang, Fremont, CA (US);

Rene Johannes Marinus van de Veerdonk, Pleasanton, CA (US);

David Kuo, Palo Alto, CA (US);

Assignee:

Seagate Technologies LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G11B 5/855 (2006.01); H01L 21/3065 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01); H01L 21/02 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01); B81C 1/00 (2006.01); B32B 27/36 (2006.01); B32B 27/28 (2006.01); B32B 27/30 (2006.01); B32B 3/30 (2006.01); G03F 7/16 (2006.01); B05D 1/00 (2006.01); C23F 4/00 (2006.01);
U.S. Cl.
CPC ...
G11B 5/855 (2013.01); B05D 1/005 (2013.01); B32B 3/30 (2013.01); B32B 27/283 (2013.01); B32B 27/302 (2013.01); B32B 27/308 (2013.01); B32B 27/36 (2013.01); B81C 1/00031 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C23F 4/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0035 (2013.01); G03F 7/165 (2013.01); G03F 7/203 (2013.01); G03F 7/2022 (2013.01); G03F 7/2059 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/02112 (2013.01); H01L 21/3065 (2013.01); B32B 2457/14 (2013.01); B81C 2201/0149 (2013.01); Y10T 428/24612 (2015.01);
Abstract

Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

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